Parsons Hosts New York Fashion Lawyer to Lecture in New York City on Copyright, Licensing, and other
Parsons Hosts New York Fashion Lawyer to Lecture in New York City on Copyright, Licensing, and other Protection for Fashion Designs New York City Attorney's review of design patent, trademark, copyright, and licensing contracts draws students wary of current market. (PRWEB) February 27, 2010 -- The Law Office of David H. Faux recently gave a lecture entitled 'IP Lookbook: A Primer on Protection for Designers' at New York City's pre-eminent Parsons the New School for Design. There have been discussions of developing the lecture into a short
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